Okay, hier mal der ganze Absatz:
A promising method for repairing carbon damaged low-k dielectric materials is through the use of a silylation reaction. A silylating agent typically has two distinct components joined by a Si atom: an organic substituent and a hydrolysable substituent. The reaction can proceed through an intermediate hydrolysis in hydrated media or as a direct reaction with SiOH bonds in the film in the absence of moisture. Nitta et al  have reported a systematic study of key aspects of silylating agents. They showed that difunctional silylating agents (those with two hydrolysable groups) were most effective at restoration. Monofunctional silylating agents such as HMDS (hexamethyldisilazane) and TMCS (trimethylchlorosilane), which were the focus of earlier studies, were not as efficient in eliminating SiOH groups in the film.